New Tecnilith® Amber Phototool Film Delivers

Simpler Processing, Sustained Performance And Superior Resolution

MATTHEWS, N.C. – Extremely stable and easy to develop Tecnilith® Amber Film is the latest addition to the line of low haze, diazo-based phototooling products available to global PCB manufacturers from Exopack Advanced Coatings.

To maximize dimensional stability and durability, the new Amber Film is coated on a 0.007-inch polyester base. Designed for use with Tecnilith® Artwork Protect Film, it withstands repeated handling and vacuum-frame draw-downs. The film maintains performance and resists degradation caused by repeated use.

“With its ease of development, low D-Min starting point, enhanced contrast and exceptional resolution properties, new Tecnilith® Amber Phototool Film is the perfect complement to every printed circuit board manufacturing process – including standard table-top ammonia developers,” said Jeff Jarvis, Global Business Manager at Exopack Advanced Coatings.

To generate enhanced resolution, the new Amber film delivers more than 1,000 lines/mm. The film retains its initial image geometry and duplicates sharply defined images free of graininess. Because of its minimal infrared absorption, the new film eliminates the threat of expansion and serious heat build-up.

Development of the new film requires no washing or drying and overdevelopment is impossible. The non-silver images enhance visual see-through – providing rapid, accurate resolution free of problems common to silver halide films.

For more information about Exopack Advanced Coatings, its products and availability of technical support, visit www.exopackadvancedcoatings.com.

About Exopack Holding Corp.

With 18 production facilities strategically positioned across North America and the United Kingdom, as well as a global network of alliance partners, Exopack is an established leader in the development, manufacture and sourcing of plastic flexible solutions and coatings for various consumer and industrial end-use markets.

« Back to top?
Updated on February 2nd, 2010 by Gwen Simms